Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

As semiconductor devices become more complex, so do the methods for patterning them. Ever-smaller features at each new node require continuous advancements in photolithography techniques and ...

Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a ...

Self-aligned lithographic process techniques are playing an increasingly important role in advanced technology nodes. Even with the growing use of extreme ultraviolet (EUV) lithography, ...

Researchers have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible ...

Recently, a research team led by Prof. LI Yue from Hefei Institutes of Physical Science (HFIPS), Chinese Academy of Sciences (CAS) has introduced a self-confined solid-state dewetting mechanism. This ...